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Indium Tin Oxide, ITO (In2O3/SnO2 90/10 wt %) Sputtering Targets

Indium Tin Oxide, ITO (In2O3/SnO2 90/10 wt %) Sputtering Targets Overview

Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. To speak to someone directly about current pricing or for a quote on sputtering targets and other deposition products not listed, please click here.

Indium Tin Oxide, ITO (In2O3/SnO2 90/10 wt %) General Information

Indium Oxide/Tin Oxide (In2O3/SnO2 90/10 WT%) is among one of the most heavily utilized compounds in the thin film industry due to its electrical conductivity and optical transparency. Specifically, the 90/10 WT% composition has a melting point of approximately 1,800°C and a density of 7.14 g/cc. The color of various ITO compounds range from pale yellow to dark green or dark grey. It is evaporated or sputtered under vacuum to generate transparent conductive layers in the manufacture of LCDs and various optical coatings. Thin films of ITO are created for the development of sensors, as well as, a glass coating for the automotive industry.

Indium Tin Oxide, ITO (In2O3/SnO2 90/10 wt %) Specifications

Material TypeIndium Tin Oxide SymbolIn2O3/SnO2 90/10 wt % Melting Point (°C)1,800 Theoretical Density (g/cc)7.14 Max Power Density
(Watts/Square Inch)20* Type of BondIndium, Elastomer

* This is a recommendation based on our experience running these materials in KJLC guns. The ratings are based on unbonded targets and are material specific. Bonded targets should be run at lower powers to prevent bonding failures. Bonded targets should be run at 20 Watts/Square Inch or lower, depending on the material.

* Suggested maximum power densities are based on using a sputter up orientation with optimal thermal transfer from target to the sputter cathode cooling well. Using other sputtering orientations or if there is a poor thermal interface between target to sputter cathode cooling well may require a reduction in suggested maximum power density and/or application of a thermal transfer paste. Please contact for specific power recommendations.

Z-Factors

Empirical Determination of Z-Factor

Unfortunately, Z Factor and Shear Modulus are not readily available for many materials. In this case, the Z-Factor can also be determined empirically using the following method:

• Deposit material until Crystal Life is near 50%, or near the end of life, whichever is sooner.
• Place a new substrate adjacent to the used quartz sensor.
• Set QCM Density to the calibrated value; Tooling to 100%
• Zero thickness
• Deposit approximately to A of material on the substrate.
• Use a profilometer or interferometer to measure the actual substrate film thickness.
• Adjust the Z Factor of the instrument until the correct thickness reading is shown.

Another alternative is to change crystals frequently and ignore the error. The graph below shows the % Error in Rate/Thickness from using the wrong Z Factor. For a crystal with 90% life, the error is negligible for even large errors in the programmed versus actual Z Factor.

Notes:

• Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity. Request more information, please

  is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity. Request more information, please click here

• ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock. Please Ramp Procedure for Ceramic Target Break-in.

  This material may require specialandprocedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock. Please click here forfor

Sputtering targets are materials used to make thin films for many high-tech products, like those in electronics, cars, and renewable energy. Two important types are Indium Tin Oxide (ITO) and iron sputtering targets, which help create coatings that conduct electricity and protect surfaces. As technology changes, new trends are making these materials more efficient, affordable, and better for the environment. Here&#;s what we can expect in the future.

Advanced Targets Product Page

Making Better Use of Materials

One of the biggest problems in sputtering is the waste of materials. Current sputtering methods often use only a small part of the target, which leads to waste and higher costs.

New Ways to Reduce Waste

To fix this, new methods are being developed to use more of the target material. For example, rotating targets and better magnetron designs can help spread out the use of the material more evenly. This means less waste and lower costs. New power technologies can also make the sputtering process use less energy. These changes can help both ITO and iron sputtering be more efficient and environmentally friendly.

Finding New Materials to Use

ITO is popular for things like touchscreens, displays, and solar panels because it is clear and conducts electricity well. But it depends on indium, which is a rare and expensive metal.

Looking for Other Options

Scientists are looking for other materials that can do the same job as ITO but are easier to find and less expensive. Some good options might be aluminum-doped zinc oxide (AZO) or graphene-based materials. These materials can offer similar benefits without the high cost or supply problems of indium. This shift could lead to new designs and uses for future devices.

Improving How Sputtering Targets Are Made

The quality of sputtering targets affects how well the thin films they create will perform. So, better ways to make these targets are becoming more important.

Better Production Techniques

New methods in powder metallurgy can help create a more uniform material with fewer impurities. Improved bonding methods can make the targets stronger and less likely to have defects. Also, new casting techniques can help produce larger and more consistent targets, leading to fewer mistakes and better-quality films. These improvements are important for products like screens, solar cells, and electronics that need high-performance coatings.

Focusing on Recycling and Sustainability

With growing concerns about the environment, recycling sputtering targets, especially those with rare materials like indium, are becoming more important.

Developing New Recycling Methods

Future trends will likely focus on better recycling techniques to recover valuable materials from used targets. Improved chemical and mechanical methods could make it easier to get back indium and other rare elements. This approach will reduce waste and lower costs, while also supporting a circular economy where materials are reused, reducing the need for new resources.

Using Digital Technology

Digital tools are changing how sputtering is done by using technologies like IoT (Internet of Things), AI (Artificial Intelligence), and machine learning.

Smarter Manufacturing

These tools help control the sputtering process in real time, monitor equipment, and predict when maintenance is needed, preventing breakdowns. For ITO and iron sputtering, this means better production, less downtime, and higher quality. By using data analysis, these technologies can also help find new ways to improve the process, making it more adaptable to changing needs.

Finding New Uses in the Market

As new uses for sputtered films are discovered, demand for ITO and iron sputtering targets is likely to grow in different markets.

Expanding into New Areas

For example, ITO is becoming more popular in flexible electronics and wearable devices that need materials to be both flexible and conductive. At the same time, iron sputtering targets are being used in energy storage technologies, like batteries, to improve performance and lifespan. As these markets expand, so will the need for ITO and iron-sputtering targets, opening up new opportunities.

Conclusion

At Stanford Advanced Materials, we aim to lead in these future trends. With our experience in high-quality sputtering targets, we are ready to meet the changing needs of our customers and support new technology. Check out our range of sputtering targets today to see how we can help you stay ahead in this evolving industry.

Author:

SAM Sputter Targets

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. View all posts by SAM Sputter Targets

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